For multi-step semiconductor processes, RENA offers the compact Revolution+, a flexible, automated wet bench featuring a central rotary robot and up to three process and three rinsing tanks and integrated drying. This platform is designed for efficient surface treatment, including etching, cleaning, and resist stripping, and is ideal for both FEoL and BEoL applications. With RENA software, the Revolution+ provides advanced process control and monitoring. Specialized configurations, such as patented metal etching can be integrated based on customer requirements. The “Revolution+” combines a small footprint with low water and chemical consumption, offering a highly efficient, cost-effective solution.