SAT - spray batch system for acids and bases

SAT – Spray Acid Tool

Applications for wet chemical cleaning and etching processes are performed highly efficiently including rinsing and drying. RENA spray batch system is designed for acids and bases. Up to five processes can be combined in one chamber; this offers great potential for efficiency and process optimization. No direct contact to chemical by operator, this makes the process safe.

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Features and Benefits

Reduced medium consumption
Optimized footprint
Single or dual cassette handling
Highly serviceable, easy access
SECS/GEM Interface Options
Flexible and Upgradeable
Improved operator user safety
Manual Load
Single and Dual Process Chambers
Compacted Footprint
Three cabinet Sizes
24 in, 76 in and 92 inches wide
25 wafer load 50mm to 200mm low pro
Typical Throughputs: Single Chamber 75-100 wph, Dual Chamber 150-200 wph
Enclosed controlled environment
Dry to Dry operation
25 wafer chamber

2 and 4 tank configurations
On board chemical mixing with metering pumps and level sensors
23 liter tank with full level set at 16 Liters
On-axis horizontal wet-processing design keeps wafers parallel to the flow
Uniform boundary layer coverage across load
Options: End Point Detection and Chemical Concertration Monitoring
Increased Bath Life
Software programmed time based over-etch allows for consistent run to run processing
EPD overcomes the challenges of visually inspecting the wafer surface during process as the metal etch occurs.
Optimized Process
Recipe step advance is determined by when the etch is complete, not by a pre-set amount of time resulting in consistent processing.
Higher throughput results from faster etch process steps.
Clamshell Carriers used to see front wafer to detect when etch is complete

Spray Acid Tool for applications for wet chemical cleaning and etching processes which are performed highly efficiently including rinsing and drying