Advancer Gemini: Double Wet Processing Capacity for Labs

A compact, cost-effective immersion wet bench for semiconductor R&D and small-scale production – engineered for higher throughput, flexible wafer processing, and efficient lab operations.

Laboratories and R&D teams in the semiconductor industry face increasing pressure to scale their processes while maintaining precision, flexibility, and cost efficiency. With Advancer Gemini, labs can now double their wet processing capacity without increasing their footprint.

The Advancer Gemini is a next-generation immersion wet bench designed specifically for semiconductor surface treatment applications in research labs and pilot production environments. Built for dual-step processing, the system integrates rinsing and optional drying operations into a streamlined workflow, enabling faster and more efficient wafer processing.

Designed for High-Performance Lab Wet Processing

Advancer Gemini delivers best-in-class performance for single-step semiconductor wet processing applications. The system features two integrated robots, advanced process software, and a unified workflow platform that supports both 6-inch and 8-inch wafers. This versatility makes it ideal for a wide range of applications, including surface cleaning, chemical treatments, and substrate preparation.

Thanks to its intelligent automation and optimized process flow, labs can achieve significantly higher throughput while maintaining excellent process control and repeatability.

Double Throughput – Same Footprint

Built on the proven architecture of the Advancer Classic, the Advancer Gemini combines reliability with increased productivity. The system includes all capabilities of the Classic platform, while delivering twice the throughput per square foot.

This means research teams can scale their processing capacity without expanding lab space or increasing equipment costs, making it an attractive solution for growing semiconductor R&D operations.

Flexible Process Control and Monitoring

Advancer Gemini provides researchers with the flexibility to fine-tune their wafer processing workflows. Its advanced control and monitoring software enables precise adjustment of process parameters, ensuring optimal results for various semiconductor materials and applications.

The system’s dual-robot configuration ensures smooth wafer handling and efficient workflow management, reducing idle times and maximizing tool utilization.

Optimized for Efficient Lab Operation

Efficiency and ease of maintenance were key design priorities for Advancer Gemini. The system incorporates a maintenance-friendly architecture with shared facilities and electronics, simplifying service and reducing downtime.

Additional efficiency benefits include:

• Reduced DI water consumption

• Optimized chemical usage

• Lower waste disposal costs

• Compact footprint for space-constrained labs

These features make the Advancer Gemini a cost-effective wet bench solution for semiconductor laboratories and pilot production lines.

» You can find the video “Advancer Gemini” here

» If you would like to get in touch with our sales team, we look forward to hearing from you