Thank You for an Inspiring 19th Silicon Saxony Day!

We at RENA Technologies – specialists in wet chemical process solutions for the semiconductor industry – were proud to participate in the 19th Silicon Saxony Day on June 26, 2025, held at Dresden Airport Terminal.

At our booth A20, we showcased two of our latest surface treatment systems:
Revolution+ and Convergence – developed for maximum performance, precision, and flexibility.

The fully automated wet bench Revolution+ is designed for efficient surface treatment processes, including etching, cleaning, and resist stripping. It is suitable for both FEoL and BEoL applications.
Our wafer processing platform Convergence stands out with its highly flexible design. It offers specialized tank configurations, parallel processing of various wafer thicknesses, and multiple drying options.

With over 900 participants, 130+ exhibitors, and more than 50 speakers, the event brought together some of the brightest minds in semiconductors, microelectronics, and smart systems.

A heartfelt thank you to everyone who visited us at our booth – it was a pleasure to connect and exchange ideas with you!

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