October 23, 2024
Successful participation of RENA Technologies at the ICSCRM 2024 in Raleigh, USA
The conference provides a valuable platform for sharing the latest scientific and technical developments in the field of silicon carbide (SiC). Researchers and engineers from industry, academia and the public sector came together to share their findings and discuss innovative solutions. In addition to the exciting scientific sessions, the accompanying exhibition was also a highlight, which was open throughout the conference and offered participants the opportunity to find out about the latest products and technologies in the field of silicon carbide.
Among other things, the new and unique system on the market called “Revolution+” was presented at the RENA Technologies stand. Our dedicated cleaning process for SiC-substrates generates unmatched cleanlyness results. The compact “Revolution+”, a flexible, semi-automatic wet bench with a central rotary robot and up to three process and three rinsing tanks, is offered for multi-stage semiconductor processes. This platform has been developed for effective surface treatment, including etching, cleaning and resist stripping. It is equally suitable for FEoL and BEoL applications. The wet bench“Revolution+” features enhanced process control and monitoring with IDX Flexware software. Depending on the customer's requirements, special designs such as patented metal etching and lift-off tanks can be installed. The small footprint and low water and chemical consumption make the Revolution+ production system an absolute advantage. The machine met with great interest.
RENA Technologies is proud to be part of these important trade fair and conference days and to be able to present our new innovations. We were also pleased with the many great technical discussions we had with partners and interested parties.
We look forward to incorporating the knowledge and contacts gained into future projects and developments. Many thanks to the organizers and all participants for making this conference an inspiring experience!