RENA BatchEtch N automated processing equipment

Silicon solar cell etching

The RENA BatchEtch N automated processing equipment is a batch-type etching processes for silicon solar cells. Depending on customer requirements, alkaline and acidic processes are available. Cleaning steps can also be integrated into the tool. The equipment is based upon the RENA Batch N platform.

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Features and Benefits

Fully automated Saw Damage Removal (SDR) in a Batch type process
Boron emitter removal
Etching with alkaline (e.g. KOH) or acidic solutions (e.g. HF/HNO3)
Throughput up to 15000 wph
Integrated rinsing and drying of wafer
Long bath lifetime due to feed-and-bleed function
Pre- or postcleaning steps can be integrated into the tool
Tank-in-tank design for improved process homogeneity and reduced space requirement
Best-in-class dosing system for accurate and constant bath composition
Uses downholder-free carrier
Lowest breakage rate in industry
Easy maintenance
Available as BatchEtch N400 (400 wafer per bath), N200 (200 wafer per bath) or N50 (50 wafer per bath)

Options

Adaption for thin wafer down to 100 µm
Weighing scale: automated etch loss measurement
MES interface (SECS/GEM)
Load and Unload Extension for buffering carriers
Media cabinet for chemical supply
Waste pump station for chemical drain / waste water
Filter fan units (“Flowboxes”)
Sensors for process control (e.g. pH, conductivity)

solarmachine BatchEtch N400 Fully automated

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Downloads

Datasheet BatchEtch N600

(641 KB)