Poly-Si etching and cleaning optimized by RENA. The BatchPolyClean provides a substantial enhancement in efficiency and optimal process performance. This system is compatible with various wafer sizes ranging from M0 to G13, as well as high-capacity cassettes. As a result, it delivers a notable increase in throughput, reaching up to 15 000 wafers per hour, while significantly reducing the overall cost of ownership.

RENA BatchPolyClean sets a new standard for the removal of poly-Si, shunt etch
and subsequent high-performance cleaning for TOPCon cells in the solar industry.