Hi-ETA clean®

Boost your efficiency

The new Hi-ETA clean^® additive with proven efficiency gain of 0.05 % without increasing the footprint of the tool. Designed for cleaning of monocrystalline p- and n-type Si-wafers the additive boosts your production in combination with new or existing Inline PSG/BSG etch (InEchSide), BatchTex N400 or N600 tools.

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Features and benefits

Enhanced metal cleaning with HF/HCl
Increase of the metal clean bath lifetime up to 600 runs
Proven efficiency gain of 0.05 % in TOPCon production lines
Easy upgrade of existing lines to the new cleaning technology
Large process window
Cost effective usage of additive
Environmental-friendly

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Downloads

Datasheet Hi-Eta Clean

(1 MB)