ACE - Advanced Chemical Etching for SiC-wafers

Silicon carbide (SiC) is gaining traction in power electronics and automotive semiconductors as a key enabler of electromobility. Compared to traditional silicon, SiC offers several advantages, including smaller component sizes, shorter charging times, and enhanced efficiency. Its wide band-gap properties make it especially promising for the future of battery electric vehicles (BEVs). Nevertheless, processing SiC presents unique challenges. For instance, its inert nature makes it resistant to all standard wet etching techniques. RENA’s ACE process provides a breakthrough by enabling chemical etching of SiC through an innovative system design.

Features and Benefits

  • Compact automated equipment
  • Essential for next generation power devices
  • Worlds first wet etching solution for SiC
  • Strain release
  • Defect removal
Franck Delahaye Head of Business Development
Head of Business Development
Franck Delahaye
ResponsibleResponsible for the following countries:
Worldwide