Genesis Marangoni Dryer: semiconductor wafer drying

Genesis – Integrated and stand-alone Marangoni dryer

The RENA Genesis Marangoni dryer combines drying process with cleaning and rinsing, providing a one-step process. Genesis is a patented technology providing outstanding wafer cleanliness and water removal. These dryers can be applied both as standalone platforms or as integrated into batch immersion wet benches. The entire process is monitored and controlled by RENA’s exclusive IDX Flexware process control software. RENA’s Marangoni dryer offers superior performance, improved yield and reduced particle presence.

Contact us!

Get in touch!

Features and Benefits

Cost effective
Robust, efficient and clean
Manual or automated wafer handling
Wafer sizes 50 – 200 mm
Teflon cassettes
Dries hydrophobic and hydrophilic surfaces
No damage to photo resist
Low IPA usage (< 20 ml per dry cycle)
Superior particle performance
Typical cycle time 7-20 minutes
Integrated DI water filtration option
Optional chemical injection
Optional IPA recirculation for more robust particle performance

Genesis stand-alone Marangoni Dryer for hydrophobic and hydrophilic surface

1 of 5

white Genesis stand-alone Marangoni Dryer which utilizes a proprietary design with wafer lifter and integrated tilt

2 of 5

chemical cleaning before dry with no air interface during the process

3 of 5

Manually loaded cassettes or automated wafer handling with robot for wafer size solutions for 50-200 mm (2-8" wafer)

4 of 5

Teflon cassettes with integrated tilt that features minimizes contact on the black side of the wafer

5 of 5