Metal Lift-Off with ISODry™
ISODry™ Technology
RENA ISODry can be integrated into RENA solvent immersion platforms. The entire process is monitored and controlled by RENA’s exclusive IDX Process Control software.
Features and Benefits
- Lowers cost for integrated dry
- Maintains POR for users with Single wafer IPA drying
- Wafer lifter ensures minimal contact area
- Integrated hot N2 produced by heat exchanger for lower energy cost
- Continuous IPA Recirculation
- Reduced IPA usage compared to other typical Vapor or vacuum dryers
- Lower Exhaust Requirements
- IPA use per wafer is similar to other Marangoni dryers
- Advanced software control capabilities with IDX Flexware
- Particle performance < 20 at 150 nm
