Showcasing Innovation at CS MANTECH 2025 in New Orleans

From May 19 to 22, 2025, we took part in the International Conference on Compound Semiconductor Manufacturing Technology (CS MANTECH), held in New Orleans, Louisiana.

At Booth #212, our team proudly presented our advanced wet processing solutions tailored to the demanding requirements of compound semiconductor manufacturing. Throughout the event, we welcomed numerous visitors and engaged in valuable technical exchanges with industry experts from around the globe.

Our exhibition highlights included:

•  ACE – Advanced Chemical Etching: A highly precise etching solution specifically developed for SiC wafers, delivering outstanding process control and surface quality.
• Revolution+: Our compact and fully automated wet bench designed for seamless integration of multi-step wet chemical processes—ideal for high-mix, low-volume production environments.
• TruEtch & FluidJet Technologies: These innovative tank systems offer uniform etching performance and efficient metal layer removal, ensuring reliable and reproducible results.

We were delighted by the strong interest in our technologies and the many inspiring conversations we had during the conference. The positive feedback and technical dialogue confirmed our commitment to delivering high-performance, application-oriented solutions.

We thank all visitors and partners for making CS MANTECH 2025 such a rewarding experience and look forward to reconnecting at future events!

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